Silicon superficial texturing bypulsed laser

Authors

  • L. Ponce IMRE-Univ. de La Habana
  • A. Castellanos IMRE-Univ. de La Habana
  • M. Arronte IMRE-Univ. de La Habana
  • T. Flores IMRE-Univ. de La Habana
  • E. Rodríguez IMRE-Univ. de La Habana
  • R. León IMRE-Univ. de La Habana
  • A. Montaigne IMRE-Univ. de La Habana

DOI:

https://doi.org/10.3989/revmetalm.1998.v34.i2.678

Keywords:

Laser, Texturing, Silicon, Reflectance, LIPSS

Abstract


Texturing of silicon surfaces with pulsed laser is made. The method is based on the formation of laser- induced periodic surface structure (LIPSS). The process is temporary characterized through the dynamic reflectance, thus determining the formation threshold of the structure. Relation between the different textures and the spectral reflectance of the samples before and after the treatment is also characterized. The mean value of spectral reflectance decreases up to a 6 %.

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Published

1998-04-30

How to Cite

Ponce, L., Castellanos, A., Arronte, M., Flores, T., Rodríguez, E., León, R., & Montaigne, A. (1998). Silicon superficial texturing bypulsed laser. Revista De Metalurgia, 34(2), 144–147. https://doi.org/10.3989/revmetalm.1998.v34.i2.678

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