Thin layer thickness evaluation by EDS analysis and Monte Carlo simulation

Authors

  • J. C. García INASMET-Tecnalia
  • F. Peñalba

DOI:

https://doi.org/10.3989/revmetalmadrid.10XIIPMS

Keywords:

Nanometric thin layers, Monte Carlo, EDS, Steels, Metallic materials

Abstract


This work shows a method to evaluate the thin layer thickness by the X ray dispersive energy (EDS) technique. The analytical measures of the area of characteristic peaks carried out with this technique are complemented with electron trajectories on the interaction volume byMonte Carlo simulation. These together with the estimations obtained for the characteristic peaks intensities according to Bethe, Joy&Luo algorithm makes possible to estimate the thickness of samples.

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References

[1] D.C. Joy, A.D. Romig y J.I. Goldstein, Principles of analytical electron microscopy, Plenum Press, Nueva York, EE. UU., 1989, pp. 3-9.

[2] D.E. Newbury, D.C. Joy, P. Exhlin, C.E. Fiori y J.I. Goldstein, Advanced scanning electron microscopy and X-ray microanalysis, Plenum Press, Nueva York, EE. UU., 1987, pp. 7-19.

[3] J.M. Palacios, J.L. Arana, J.I. Larburu y L. Iniesta, La fabricación del acero, Ed. Spainfo, Unesid, Madrid, España, 2002.

[4] J.M. Walls, Methods of surface analysis: techniques and applications. Cambridge University Press, Inglaterra, 1989, pp. 127-168.

[5] L.A. Giannuzzi y F.A. Stevie, Introduction to focused ion beams, Springer Science, Nueva York, EE. UU., 2005, pp. 1-12.

[6] Materials science and technology: a comprehensive treatment. Vol. 7. Ed. R.W. Cahn P. Haasen y E.J. Kramer, VCH, Nueva York, EE. UU., 1992, pp. 792-797.

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Published

2010-12-31

How to Cite

García, J. C., & Peñalba, F. (2010). Thin layer thickness evaluation by EDS analysis and Monte Carlo simulation. Revista De Metalurgia, 46(Extra), 95–100. https://doi.org/10.3989/revmetalmadrid.10XIIPMS

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