Comportamiento de películas delgadas de níquel y óxido de níquel en NaCl al 3 %

C. R. Magaña; M. E. Ángeles; F. J. Rodríguez

doi:10.3989/revmetalm.2006.v42.i1.6

Behaviour of nickel and nickel oxide thin films in chloride media

Authors

C. R. Magaña Dpto. Ing. Metalúrgica, Facultad de Química, UNAM
M. E. Ángeles Dpto. Ing. Metalúrgica, Facultad de Química, UNAM
F. J. Rodríguez Dpto. Ing. Metalúrgica, Facultad de Química, UNAM

DOI:

https://doi.org/10.3989/revmetalm.2006.v42.i1.6

Keywords:

Nickel, Nickel oxide, Magnetron DC Sputtering, Chloride media

Abstract

The aim of this work is to study the behaviour of both: a nickel thin film deposited on steel AISI 1018 (UNS G 10180) and a superior nickel oxide electrochemically obtained on the film; with the purpose of decreasing the corrosion rate of low carbon steel immersed in a solution of NaCl 3% wt, thus efficient anticorrosive protection could be obtained. Two film deposition techniques were used: electrochemical and magnetron DC sputtering; and the protective properties of deposited films exposed to the aggressive media, were evaluated. The characterization of different films was carried out by using electrochemical techniques: polarization curves and electrochemical impedance.

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Published

2006-02-28

How to Cite

Magaña, C. R., Ángeles, M. E., & Rodríguez, F. J. (2006). Behaviour of nickel and nickel oxide thin films in chloride media. Revista De Metalurgia, 42(1), 49–55. https://doi.org/10.3989/revmetalm.2006.v42.i1.6

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Issue

Vol. 42 No. 1 (2006)

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Articles

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